Dimension IconIR300
Dimension IconIR300
The Dimension IconIR300™ large-sample nanoIR system provides high-speed, high-accuracy nanoscale characterization for semiconductor applications, featuring unrivaled capabilities, sample size, and material type flexibility. Through its combination of proprietary photothermal IR spectroscopy and nanoscale AFM property mapping capabilities, IconIR300 enables automated wafer inspection and defect identification on the widest range of wafer and photomask samples. The system significantly extends the application of AFM-IR technology to semiconductor industry segments beyond the reach of traditional techniques.
Built on the groundbreaking large-sample architecture of the Dimension IconIR system, IconIR300 provides correlative microscopy and chemical imaging, as well as enhanced resolution and sensitivity. Integrated with automated wafer handling and advanced data collection/analysis software, the system enables greater time- and cost-savings and production efficiency.
Superior Nanoscale IR Spectroscopy and Chemical Imaging for the Semiconductor Industry
Only the Dimension IconIR300 system provides:
- Whole-wafer, non-destructive measurement of 200 mm and 300 mm wafers;
- Unambiguous identification of organic and inorganic nano-contaminants on semiconductor wafers and photomasks with data directly correlating to FTIR libraries;
- Non-destructive step-height measurement and nanoscale material property mapping; and
- Automated, recipe-based measurements and KLARF file support for user-friendly access to comprehensive data.
Whole-Wafer Measurement of 200mm and 300mm Wafers
Our patented, unique suite of AFM-IR modes and proprietary PeakForce Tapping® property mapping modes, together with IconIR300's large sample architecture, provide ultimate sample flexibility for the broadest range of semiconductor applications. IconIR300 delivers whole-wafer measurement of samples up to 300 mm in diameter in a wide range of thicknesses and material types, including:
- Both organic and inorganic samples;
- Patterned wafers;
- Bare wafers;
- Photomasks; and
- Data storage media wafers.
Additionally, Surface Sensitive AFM-IR mode enables IconIR300 to provide unique, reliable surface-sensitive chemical measurements of polymeric films deposited on semiconductor materials.
Highest Performance Nanoscale IR Spectroscopy for Semiconductor Applications
Bruker is the innovator for photothermal AFM-IR-based nanoIR spectroscopy, the preferred technique for the nanoIR community.
Dimension IconIR300 delivers:
- Highly accurate, rich, detailed spectra with FT-IR correlation, achieving nanometer-level measurement of thin contaminants;
- A variety of advanced operational modes supporting the measurement of a wide range of samples for both industrial and academic users;
- Highest performance AFM-IR spectroscopy, the leading nanoIR mode in semiconductor applications; and
- Reliable surface-sensitive chemical measurements for polymeric films.
Highest Resolution Chemical Imaging On Wafers and Photomasks
The Dimension IconIR300’s industry-leading AFM performance and Bruker’s patented Tapping AFM-IR imaging together enhance the spatial resolution and sample accessibility of our nanoIR technology.
Dimension IconIR300 provides:
- <10nm chemical spatial resolution for imaging over a broad range of sample types, including soft organic and inorganic contaminants;
- Consistent, reliable, and high-quality data; and
- AFM-IR technology for removing any and all mechanical artifacts, ensuring only true chemical composition is collected.
Advanced Automation for Identification of Nano-Contaminants
Equipped with our proprietary AutoMET® software suite, IconIR300 enables multiple levels of automation for non-destructive AFM measurement on a broad range of sample types in both real-time and off-line.
Key automation capabilities include:
- Step height investigations along with nanoscale material property mapping.
- Optical and AFM image pattern recognition;
- Tip-centering;
- Full wafer or grid mapping support;
- Image-placement accuracy within tens of nanometers;
- Comprehensive, simple recipe writing; and
- KLARF file import capability to support nanoIR automation features.
These capabilities, together with nanoscale chemical characterization with highly resolved IR spectra, enable both academic and industrial users to overcome the limitations of traditional defect identification on semiconductor materials.
