FilmTek 2000
FilmTek 2000
The FilmTek™ 2000 is a benchtop spectroscopic reflectometer equipped with a fully automated stage and designed for rapid, reliable, and accurate characterization of nearly any unpatterned thin film. Fully customizable wafer mapping capabilities rapidly generate 2D and 3D data maps of any measured parameter. Capable of simultaneous determination of multiple film characteristics within a fraction of 1 second per site. With optional transmission capability, the FilmTek 2000 becomes a FilmTek 3000. The FilmTek 3000 combined reflection-transmission spectrophotometer provides efficient and accurate transmission and reflection measurement of unpatterned films deposited on transparent substrates. It is ideally suited for measuring the thickness and optical constants of very thin absorbing films.
Measurement Capabilities
Enables simultaneous determination of:
- Multiple layer thicknesses
- Indices of refraction [ n(λ) ]
- Extinction (absorption) coefficients [ k(λ) ]
- Energy band gap [ Eg ]
- Composition (e.g., %Ge in SiGex, % Ga in GaxIn1-xAs, %Al in AlxGa1-xAs, etc.)
- Surface roughness
- Constituent, void fraction
- Crystallinity/Amorphization (e.g., of Poly-Si, GeSbTe films)
- Film gradient
System Components
Standard:
- DUV-NIR fiber-optic spectrophotometer
- Spectroscopic reflection measurement
- Automated stage
- Advanced material modeling software
- Bruker's generalized material model with advanced global optimization algorithms
Typical Application Areas
Virtually all translucent films ranging in thickness from less than 100 Å to approximately 150 µm can be measured with high precision. Typical application areas include:
- Compound semiconductor
- LED/OLED
- Solar photovoltaic
With flexible hardware and software that can be easily modified to satisfy unique customer requirements in academic, R&D, and production environments.
Technical Specifications
| Film Thickness Range | 5 nm to 150 µm |
|---|---|
| Film Thickness Accuracy | ±1.5 Å for NIST traceable standard oxide 1000 Å to 1 µm |
| Spectral Range | 190 nm - 1700 nm (240 nm - 1000 nm is standard) |
| Measurement Spot Size | 2 mm - 5 mm (5 mm standard) |
| Sample Size | 2 mm - 300 mm (150 mm is standard) |
| Spectral Resolution | 0.3 - 2 nm |
| Light Source | Regulated deuterium-halogen lamp (2,000 hrs lifetime) |
| Detector Type | 2048 pixel Sony linear CCD array / 512 pixel cooled Hamamatsu InGaAs CCD array (NIR) |
| Computer | Multi-core processor with Windows™ 10 Operating System |
| Measurement Time | <1 sec per site (e.g., oxide film) |
| Data Acquisition Time | 0.2 sec |
Performance Specifications
| Film(s) | Thickness | Measured Parameters |
Precision (1σ) |
|---|---|---|---|
| Oxide / Si | 200 - 500 Å | t | 0.5 Å |
| 500 - 10,000 Å | t | 0.25 Å | |
| 1000 Å | t , n | 0.25 Å / 0.001 | |
| Nitride / Si | 200 - 10,000 Å | t | 0.25 Å |
| Photoresist / Si | 200 - 10,000 Å | t | 0.5 Å |
| a-Si / Oxide / Si | 200 - 10,000 Å | t | 0.5 Å |
How Can We Help?
Bruker partners with our customers to solve real-world application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.