Non-destructive Metrology for Etch and CMP
Bruker's InSight CAP automated atomic force profiler is specifically designed to be a combined platform for CMP and etch metrology for semiconductor manufacturers and suppliers. Flexible configurations to support wafer sizes from 100 mm to 300 mm enable precision measurements for a wide range of end applications. From highly productive labs to fully automated fabs the InSight CAP profiler can be optimally configured for the most cost-effective metrology solution.
At advanced technology nodes, multipattern lithography techniques place nanometer-level process control requirements on CMP to meet depth-of-focus needs. InSight CAP is built around the latest generation AFM scanner to deliver improved flatness, less than 10 nanometers, over a 65 μm X / Y scan range. The system’s NanoScope® V 64-bit AFM controller offers 5x faster engage performance and 5x faster tuning for increased productivity, all with enhanced reliability. Its DT adaptive scan mode also contributes to faster scanning and improved metrology. With its combination of advanced features, the InSight CAP High-Resolution Profiler enables angstrom-level precision to measure in-macro dishing and erosion.
Flexible configurations to support wafer sizes from 100 mm to 300 mm enable precision measurements for a wide range of end applications. From highly productive labs to fully automated fabs the InSight CAP profiler can be optimally configured for the most cost-effective metrology solution.
How Can We Help?
Bruker partners with our customers to solve real-world application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.
Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.