ScanAsyst Plus
Achieving Expert Quality Images for All Users, Now for All Topography Modes
The original ScanAsyst®, introduced in 2009, was the world’s first automatic image optimization technology for AFM. It enabled even beginning AFM users to quickly and reliably produce expert-level results. Now, Bruker has introduced ScanAsyst Plus with enhanced intelligent algorithms and even greater ease of use. ScanAsyst Plus comes standard with select NanoScope® 6 systems and brings greater capability to Bruker AFMs by expanding self-optimizing imaging to all topography modes, including PeakForce Tapping®, TappingMode™, and contact mode.
ScanAsyst Plus’ patent-pending smart functionality continuously monitors image quality and automatically optimizes scan parameters. This frees users from the often-tedious task of determining which scan parameters to adjust for a specific operating mode or for individual samples. Whether your AFM studies are focused on academic research or industrial metrology applications, ScanAsyst Plus delivers expert quality high-resolution imaging, not only independent of operator experience, but also independent of imaging mode.
ScanAsyst Plus provides:
- Simplified, consistent high-resolution imaging of surface structure and morphology for a wide range of samples (e.g., polymers, 2D materials, etc.)
- Single-button, repeatable measurements for wafer applications, such as surface roughness and defect characterization
- Stable imaging over extended periods in all imaging modes due to adaptive drift resistance
- Enhanced ease of use features to customize the level of control for parameter optimization that best suits your needs
- Automated acquisition of complete image datasets for combinatorial studies
LEFT: Topography image of a patterned array of nanopillars obtained with ScanAsyst Plus in TappingMode, using a TESPA probe. Several individual nanopillars within the array are observed to have structural defects. Image size 5 μm.
RIGHT: Corresponding amplitude error image. The symmetrical shape of the nanopillars shows how accurately ScanAsyst Plus tracks the abrupt topography changes between the substrate and each nanopillar. Image size 5 μm.
LEFT: Topography image of a patterned array of nanopillars obtained with ScanAsyst Plus in TappingMode, using a TESPA probe. Several individual nanopillars within the array are observed to have structural defects. Image size 5 μm.
RIGHT: Corresponding amplitude error image. The symmetrical shape of the nanopillars shows how accurately ScanAsyst Plus tracks the abrupt topography changes between the substrate and each nanopillar. Image size 5 μm.
Proven results on a wide range of samples:
Terrace-step nanostructure of sapphire imaged with ScanAsyst Plus in Contact Mode, using a ScanAsyst-Air-HPI probe. Image size 5 µm.
Morphology of a hydrophobic, polypropylene membrane (Celgard) made up of alternating lamellae and fibers. Image was acquired with ScanAsyst Plus in TappingMode, using an RTESPA-300 probe. Image size 3 µm.
Atomic step structure of gallium nitride (GaN) on silicon carbide (SiC) imaged with ScanAsyst Plus in TappingMode, using an OTESPA probe. Image size 5 µm.
Nanoscale grain structure of indium tin oxide (ITO) film imaged with ScanAsyst Plus in PeakForce Tapping Mode, using a ScanAsyst-Air-HPI probe. Image size 2 µm.
Lamellar aggregates of poly(diethyl siloxane) (PDES) on silicon imaged with ScanAsyst Plus in TappingMode, using an RTESPA probe. Image size 90 µm.
Surface structure of a static random-access memory (SRAM) sample imaged with ScanAsyst Plus in TappingMode, using a TESPA probe. Image size 20 µm.
