X-Ray Metrology for Compound Semiconductors

QCVelox-HR

Fully automated HRXRD and XRR for high-throughput, high-precision metrology

QCVelox-HR

QCVelox-HR is the highest productivity high-resolution X-ray diffraction (HRXRD) and X-ray reflectivity (XRR) metrology system for complex epilayer structures. HRXRD measures the crystal quality, strain, relaxation, and thickness of the epilayers, while XRR determines their thickness, density, and surface roughness. QCVelox-HR features full automation and factory integration software for production line metrology. Once data is collected, Bruker’s powerful analysis software accurately and reliably gives epilayer process parameters, with automatic reporting and immediate feedback to control and monitor production lines.

Industry-Leading
high throughput
Delivers high-precision measurements at a low cost per wafer.
Powerful
software suite
Ensures reliable measurements and results reporting.
Enhanced
process control
Results from precise measurements of strain, crystal quality, and defect density.
Features

Fully Automated Operation for Improved Process Control

QCVelox-HR provides fully automated epilayer quality control. It delivers detailed information on properties, including composition, thickness, and uniformity. This full characterization of critical structure parameters ensures that epitaxial layers and films meet specifications necessary for high-performance devices.
 

Only QCVelox-HR delivers:

  • Industry-leading high-throughput X-ray metrology for compound semiconductor manufacturing.
  • Enhanced device performance and yield through fully automated epilayer quality control.
  • Reliable measurements and results reporting with a suite of powerful and dependable software.

Automated sample loading, alignment, and measurement with QCVelox-HR produces reliable metrology data, which is then automatically analyzed and reported using Bruker’s industry-leading data analysis software. The tool’s fully automated, high-precision epilayer quality control enables manufacturers to:

  • Shorten the R&D cycle
  • Develop high-performance devices
  • Reduce time to market
  • Accelerate production ramp
  • Fully optimize yield through control of key parameters
  • Improve quality and reliability during mass production
Fully automated process control feedback loop enabled by QCVelox-HR.

Highest Throughput

High throughput and precision enable higher sampling rates per wafer, allowing manufacturers to identify process issues early, improving product quality and reducing waste. Bruker has incorporated numerous unique design features to achieve the fastest possible measurements with high precision. This innovation is backed by our extensive experience and expertise in providing cutting-edge, reliable equipment to the semiconductor industry.
 

Seamless Integration

Leveraging extensive inline experience in fully automated fabs, Bruker has developed industry-leading software for automated analysis and reporting. Essential features are integrated, including batch fitting functionality for offline data analysis, automated wafer reports with pass/fail criteria, and optional reporting via SECS/GEM.

Applications

Comprehensive X-ray Metrology for Compound Semi

Rocking Curves for Twist and Tilt

The full width at half maximum (FWHM) of the symmetric GaN (002) rocking curve and the skew symmetric GaN (102) rocking curve are used together to measure the twist and tilt mosaic of the GaN channel.

Omega-2Theta Scans for Composition and Thickness

The full width at half maximum (FWHM) of the symmetric GaN (002) rocking curve and the skew symmetric GaN (102) rocking curve are used together to measure the twist and tilt mosaic of the GaN channel.

X-ray Reflectometry of Barrier and Cap Layers

XRR precisely measures the thickness, density, and surface roughness of the AlGaN barrier and GaN cap layers, providing critical data for evaluating the film's quality. Bruker’s multi-stage REFS modeling method provides precise characterization of these layers.

Qz Scan for Composition of Barrier Layer

Bruker’s composition scan addresses the challenge of buffer peaks masking the barrier layer peak by performing a direct line scan across the GaN layer in the L direction of reciprocal space. This method allows for accurate measurement of the AlGaN barrier layer with minimal buffer layer interference and can be easily integrated into a recipe.

RSM for Whole Structure Analysis

Determining the composition and relaxation of barrier and buffer layers in semiconductor devices is complex but crucial for failure analysis and device reliability. Bruker’s asymmetric RSM solution addresses this with precise measurements, fast data collection via a high-intensity 1D detector, and automated analysis using PeakSplit software.

Combining HRXRD and XRR for Comprehensive Analysis

QCVelox-HR accurately measures the epitaxial layers and automatically reports the parameters, providing fast feedback to production. HRXRD measures the crystal quality, strain, relaxation, and thickness of the epilayers, while XRR determines the thickness, density, and surface roughness of the epitaxial layers. 

Specifications

QCVelox-HR Automation and Facilities Specifications

Each wafer manufacturing facility and semiconductor fab has its own specific requirements and challenges. Our listed product specifications and offerings are always a starting point for a conversation with our experts to determine how our capabilities can meet your needs.

Wafer Handling Wafer robot with open cassette up to 200 mm; EFEM 200 mm-300 mm FOUP, 150 mm-200 mm SMIF
SECS/GEM Yes
Cleanliness Specification ISO Class 3
Standards Compliance SEMI S2, S8, S14, S22, S23, F47
Footprint (with EFEM) 1.35 m x 2.6 m
Software

Powerful Software for Automated Analysis and Reporting

QCVelox-HR offers the following suite of robust and dependable Bruker software:

  • RADS for analysis of HRXRD data and reporting of composition, thickness, relaxation
  • REFS for analysis of XRR data and reporting of thickness, density, roughness
  • PeakFitting for FWHM and multi-peak fitting for reporting of barrier composition in complex structures
  • PeakSplit for automated 2D fitting of reciprocal space maps and offline relaxation and tilt analysis
  • QuickGraph for offline data display and basic analysis
RADS software interface during HRXRD analysis.

Support

How Can We Help?

Bruker partners with our customers to solve real-world application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.

Our highly trained team of support engineers, application scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.

Contact Expert

Contact Us About QCVelox-HR

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