On-Demand Session: High-Resolution Measurement of Film Thickness and Refractive Index for Silicon Photonics and Planar Waveguide Applications
Learn about state-of-the-art spectroscopic reflectometry and ellipsometry measurement techniques
High-Resolution Measurement of Film Thickness and Refractive Index for Silicon Photonics and Planar Waveguide Applications
PRESENTATION HIGHLIGHTS:
- [00:00:00] Introduction to Silicon Photonics
- [00:02:38] Introduction to Reflectometry
- [00:09:42] Introduction to Ellipsometry
- [00:13:38] Introduction to FilmTek Technology and products
- [00:22:09] FilmTek Solutions for Silicon Photonics
- [00:47:01] Conclusion
Q&A
PRESENTATION HIGHLIGHTS:
- [00:00:00] What wavelength range is typically used on your systems and why?
- [00:01:11] What is the minimum spot size available on the sample?
- [00:01:51] How many significant digits in n and k can be determined?
- [00:02:23] Polishing of the surface layer of an optical materials such as LiO2 can change the n and k values and scattering. Can ellipsometry and reflectance measurements show this polishing effect?
- [00:03:56] Can you expand on what value ellipsometry provides for waveguides and silicon photonic applications? Can we just use reflection?
- [00:05:28] Can measurements be taken on both blanket and patterned wafers?
- [00:06:21] How difficult is the modeling and how much time per point does data processing take?
