RADS Software
Software that enables fast and accurate XRD measurement analysis
Bruker RADS is the most trusted software in the industry to simulate and analyze high-resolution X-ray diffraction (HRXRD) data from epitaxial thin-film structures on single crystal substrates. It is the software of choice for R&D, production, and in academia, for detailed analysis of simple and complex structures.
RADS software offers its users a multitude of tools that enable accurate and fast XRD measurement analysis. By automatically calculating process parameters, and immediately processing feedback to production, RADS software is designed from the ground up to improve process and yield results. This exclusive combination of features has allowed RADS to be the leading process monitoring & analysis software since 1991.
New Features
- Themed GUI, which allows users to select the look-and-feel of the program (Bede, Jordan Valley and a Hybrid of the two)
- Added support for bonded SOI substrates
- Enhanced the defect scattering models to include a mosaic model and also the effects of random atom displacements due to ion-implantation
- Allows two measured datasets from different reflections to be simultaneously fitted using a common structural model
- Included the ability to display depth profiles of various parameters, such as composition
- Printed reports can be created in HTML, PDF, RTF, and various other formats
- Improved batch processing capabilities
- Support multi-core processors, and the ability to be assigned to any specific core/CPU.
Specifications
- Employs the dynamical theory of X-ray diffraction (Takagi-Taupin) for accurate simulations
- Uses the SSE2/3 instructions available on modern processors for fast simulations. Simulations and fitting will run about x3-4 faster than the v3.x on the same computer.
- Includes patented data-fitting technology for reliable automated analysis of multi-layer structures
- Easily create model structures using a spreadsheet-style list of layers (including superlattices)
- Allows specification of arbitrary composition and strain profiles with layer parameter equations
- Layer parameter linking to simplify the analysis of complex multi-layer structures
- Extensive built-in and materials database, which can also be user customized
- Models epitaxy on non-001 cubic materials, such as layers on (110) and (111) oriented substrates; Also supports basel plane (c-plane) oriented hexagonal materials
- Simulates realistic instrumental conditions
- Sophisticated scientific graphing and output capabilities
- Supports a variety of data file formats (inc. Jordan Valley, Bede, Bruker, PANalytical)
- Support for writing fitted results to a relational database
- Batch analysis of multiple experimental data files
- Provides an integrated macro language and powerful automation capabilities
- Supports Windows XP, Vista and 7
