Ellipsometers and Reflectometers

Ellipsometry & Reflectometry Resource Library

Application Notes

Application Briefs

Featured Products and Technology

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Multi-Angle Reflectometry/Ellipsometry Systems

Industry-leading measurement performance for challenging ultra-thin to thin films and multilayers with 100x performance advantage over other non-contact methods

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Spectroscopic Reflectometry

Expedited film thickness and optical constant measurements well suited for in-situ production quality assessment, particularly on thick films in development and production environments and semiconductor wafers

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Spectroscopic Ellipsometry

Highly sensitive, repeatable measurement of single-layer thin films and small multilayer structures, capable of characterizing thickness and optical properties even on layers less than a single atomic layer thick

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Reflection-Transmission Spectrophotometry

Fully integrated systems combining reflection, transmission, and optional ellipsometric and polarimetry data for measuring absorbing films deposited on transparent substrates

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Ellipsometry and Reflectometry Systems

Specialized thin film metrology systems for wafer and CD metrology, designed to meet requirements not measurable with conventional equipment

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