When IR Light Meets Semiconductor
As semiconductor technology proceeds towards nanoscale single crystalline devices, the requirements in material purity and manufacturing accuracy become more grave and demanding. Both semiconductor material R&D and process analytical technology are essential to support the semiconductor line in its advancement.
FT-IR stands out as an easy and effective tool to investigate the fundamentals of semiconductors among other techniques. It is non-destructive, fast and highly sensitive for impurity quantification or failure analysis.
In line with this, Bruker has held a webinar illustrating how FT-IR can assist in R&D or process control by delivering in-depth analysis of semiconductor materials and devices.
Our Application Expert gives an Overview of:
- Silicon quality control using FT-IR
- Room and low temperature carbon and oxygen quantification in Silicon
- Shallow impurity quantification in Silicon
- Low temperature photoluminescence for Si QC
- Semiconductor device characterization and development (laser, diode, sensors etc.)
- Phonon spectroscopy and photoluminescence spectroscopy for band structure studies.
Who Should Attend:
- QC managers
- Head of laboratories
- Head of analytics
- Lab technicians
- Researchers
Dr. Dan Wu
